fig1
Figure 1. (A) Gravimetric and (B and C) voltammetric assessments of Pt deposition from 3 mM Pt K2PtCl4 and 0.5 M NaCl using either a static EQCM or an RDE (400 rpm). The insets are optical images of Pt films grown on Au-coated Si(100) wafers for 500 s at the indicated potentials. (D) Evolution of Pt film thickness, derived from XPS analysis, in relation to deposition time at -0.8 VSSCE on Au-coated Si(100) wafers, obtained from a pH 4 solution. (E) Mass change accompanying each potential pulse. (F) Pt thickness obtained by XPS and EQCM results as a function of Pt deposition pulse number. This figure is quoted with permission from Liu et al.[44].
